Multi-photon exposure system
US8605256B2 · kind B2 · utility
1Cited by
53References
31Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 17, 2009 |
| Grant date | Dec 10, 2013 |
| Priority date | — |
| Expiry date | Apr 2, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.