Patent · US Active

Method and device for cleaning an optical position measurement system for substrates in a coating installation

US8605292B2 · kind B2 · utility

0Cited by

0References

16Claims

0Family size

Assignee

VON ARDENNE Anlagentechnik GmbH · DE

Inventors

Damir Muchamedjarow · Rippien, DE
Hubertus Von Der Waydbrink · Dresden, DE
Michael Hentschel · Dresden, DE
Marco Kenne · Dresden, DE
Reinhardt Bauer · Dresden, DE
Steffen Leβmann · Dresden, DE
Thomas Bock · Neuss, DE
Reinhard Jaeger · Coswig, DE

Key dates

Filing date	Mar 28, 2011
Grant date	Dec 10, 2013
Priority date	—
Expiry date	Nov 29, 2031

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C14/54
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method and device are provided for cleaning of an optical position measurement system in a coating installation. The optical position measurement system includes a cantilever, and a sensor head having a radiation inlet and/or outlet for the reception and/or emission of an optical signal, at a free end of the cantilever. For tempering of the sensor head, a local thermoregulation is applied using a heater and/or cooling device for heating and/or cooling of the sensor head depending on thermal conductivity of material of at least the sensor head and depending on secondary heat in the coating installation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.