Patent · US Active

Apparatus comprising nanowires

US8610100B2 · kind B2 · utility

0Cited by

1References

12Claims

0Family size

Assignee

Nokia · FI

Inventors

Pritesh Hiralal · Las Palmas, ES
Alan Colli · Cambridge, GB

Key dates

Filing date	Jun 30, 2009
Grant date	Dec 17, 2013
Priority date	—
Expiry date	Aug 16, 2031

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02E60/10
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A method including: a) depositing a masking material over a substrate comprising silicon; b) removing the masking material using a first process that removes the masking material in preference to silicon; c) removing silicon using a second process that removes silicon in preference to the masking material; d) continuously repeating the sequence of steps a), b) and c) to control the creation of nanowires; and e) stopping repetition of the sequence of steps a), b) and c).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.