Patterned retardation film and method for manufacturing the same
US8610852B2 · kind B2 · utility
3Cited by
1References
38Claims
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Key dates
| Filing date | Jun 24, 2011 |
| Grant date | Dec 17, 2013 |
| Priority date | — |
| Expiry date | Jul 28, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B30/25
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A patterned retardation film includes: a substrate; a first alignment film and a second alignment film disposed on the substrate, processed by different alignment processes and having different alignment directions; and a liquid crystal layer disposed on the first alignment film and the second alignment film, wherein the liquid crystal layer is patterned into a first region, which is aligned by the first alignment film, and a second region, which is aligned by the second alignment film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.