Plasma vapor deposition system and method for making multi-junction silicon thin film solar cell modules and panels
US8613984B2 · kind B2 · utility
Inventor
Key dates
| Filing date | Mar 23, 2012 |
| Grant date | Dec 24, 2013 |
| Priority date | — |
| Expiry date | Mar 23, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/548
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plasma vapor deposition system for making multi-junction silicon thin film solar cell modules and panels including a flexible substrate disposed about and removably supported by a dual-walled cylindrical substrate support for axially rotating the flexible substrate about its longitudinal axis, the dual-walled cylindrical substrate support comprising an inner wall spaced apart by an outer wall to define a coaxial cavity; a plasma vapor deposition torch located substantially adjacent to the flexible substrate for depositing at least one thin film material layer on an outer surface of the flexible substrate; and a traversing platform for supporting the rotatable substrate support relative to the plasma vapor deposition torch, the rotatable substrate support being traversed along its longitudinal axis by the traversing platform.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.