Photodecomposable bases and photoresist compositions
US8614047B2 · kind B2 · utility
447Cited by
13References
29Claims
0Family size
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Key dates
| Filing date | Aug 26, 2011 |
| Grant date | Dec 24, 2013 |
| Priority date | — |
| Expiry date | Feb 20, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Provided are novel symmetrical and asymmetrical bifunctional photodecomposable bases (PDBs) with dicarboxylate anion groups that show increased imaging performance. Also provided are photoresist compositions prepared with the bifunctional dicarboxylated PDBs and lithography methods that use the photoresist compositions of the present invention.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.