Resin, resist composition and method for producing resist pattern
US8614048B2 · kind B2 · utility
2Cited by
25References
12Claims
0Family size
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Key dates
| Filing date | Sep 20, 2011 |
| Grant date | Dec 24, 2013 |
| Priority date | — |
| Expiry date | Mar 21, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resin having a structural unit derived from a compound represented by the following formula (I), wherein R1, A1 and ring X1 are as defined in the instant specification:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.