Raised features on transparent substrates and related methods
US8616023B2 · kind B2 · utility
10Cited by
1References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 1, 2009 |
| Grant date | Dec 31, 2013 |
| Priority date | — |
| Expiry date | May 24, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24479
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Raised features are formed on a transparent substrate having absorption of less than about 20% within a processing wavelength range. A portion of the substrate is irradiated with a light beam to increase the absorption of the irradiated portion of the substrate. Continued irradiation causes local heating and expansion of the substrate so as to form a raised feature on the substrate surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.