Linear plasma system
US8617350B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 15, 2011 |
| Grant date | Dec 31, 2013 |
| Priority date | — |
| Expiry date | Jun 15, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/477
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention relates to a linear plasma system. The linear plasma system includes a number of troughs of an electrode alternating with a number of peaks of the electrode forming a sawtooth shape, a reactive gas feed, a precursor gas feed, and a power source. The reactive gas feed is disposed on the electrode and configured to continuously release a reactive gas into an array of holes located at the trough apex. The precursor gas feed is disposed on the electrode and configured to continuously release a precursor gas into an array of holes located at the peak apex. The power source is configured to apply radio frequency power to the electrode to simultaneously interact with the reactive gas mixed with the precursor gas to generate plasma, which is used to create a product that is deposited on a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.