Process for removing sulphur-containing, nitrogen-containing and halogen-containing impurities contained in a synthesis gas
US8617501B2 · kind B2 · utility
0Cited by
3References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 3, 2009 |
| Grant date | Dec 31, 2013 |
| Priority date | — |
| Expiry date | May 30, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2257/408
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention relates to a process for finally removing sulphur-containing, nitrogen-containing and halogen-containing impurities contained in a synthesis gas, said process including: The synthesis gas purified in accordance with the process of the invention contains less than 10 ppb by weight, less than 10 ppb by weight of nitrogen-containing impurities and less than 10 ppb by weight of halogen-containing impurities.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.