Laser formation of graphene
US8617669B1 · kind B1 · utility
16Cited by
98References
9Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 7, 2010 |
| Grant date | Dec 31, 2013 |
| Priority date | — |
| Expiry date | May 25, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus and method is disclosed for synthesizing graphene comprising the steps of providing a substrate and focusing a laser beam in the presence of a carbon doping gas to induce photolytic decomposition of the gas to atomic carbon. The carbon is photolytically reacted with the substrate to grow graphene.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.