Patent · US Active

Laser formation of graphene

US8617669B1 · kind B1 · utility

16Cited by
98References
9Claims
0Family size

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Key dates

Filing dateDec 7, 2010
Grant dateDec 31, 2013
Priority date
Expiry dateMay 25, 2031

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An apparatus and method is disclosed for synthesizing graphene comprising the steps of providing a substrate and focusing a laser beam in the presence of a carbon doping gas to induce photolytic decomposition of the gas to atomic carbon. The carbon is photolytically reacted with the substrate to grow graphene.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.