Post arrays and methods of making the same
US8617799B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 21, 2009 |
| Grant date | Dec 31, 2013 |
| Priority date | — |
| Expiry date | Jul 11, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0005
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In general, in one aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, the mask feature having a surface comprising a depression, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. In general, in another aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. The first layer is composed of an amorphous material and the first structure is a post having a base side-wall angle of in a range from about 60 degrees to about 80 degrees.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.