Pattern structures in semiconductor devices
US8618679B2 · kind B2 · utility
8Cited by
4References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 25, 2010 |
| Grant date | Dec 31, 2013 |
| Priority date | — |
| Expiry date | May 6, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A pattern structure in a semiconductor device includes an extending line and a pad connected with an end portion of the extending line. The pad may have a width that is larger than a width of the extending line. The pad includes a protruding portion extending from a lateral portion of the pad. The pattern structure may be formed by simplified processes and may be employed in various semiconductor devices requiring minute patterns and pads.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.