Method to prepare a stable transparent electrode
US8623153B2 · kind B2 · utility
7Cited by
2References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 10, 2009 |
| Grant date | Jan 7, 2014 |
| Priority date | — |
| Expiry date | Mar 17, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/833
Abstract
The present application discloses a method for producing a stable ultra thin metal film that comprises the following steps: a) deposition, on a substrate, of an ultra thin metal film, such as an ultra thin film of nickel, chromium, aluminum, or titanium; b) thermal treatment of the ultra thin metal film, optionally in combination with an O2 treatment; and c) obtaining a protective oxide layer on top of the ultra thin metal film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.