Ultraviolet activated antimicrobial surfaces
US8623446B2 · kind B2 · utility
2Cited by
6References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 3, 2006 |
| Grant date | Jan 7, 2014 |
| Priority date | — |
| Expiry date | Dec 9, 2030 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61L2300/606
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention is directed to an ion plasma deposition (IPD) method adapted to coat polymer surfaces with highly adherent antimicrobial films. A controlled ion plasma deposition (IPD) process is used to coat a metal or polymer with a selected metal/metal oxide. Exposing the coated surface to ultraviolet light significantly improves the antimicrobial properties of the deposited coatings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.