Substrate processing apparatus
US8631809B2 · kind B2 · utility
9Cited by
1References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 17, 2010 |
| Grant date | Jan 21, 2014 |
| Priority date | — |
| Expiry date | Nov 21, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An interface block is constituted by a cleaning/drying processing block and a carry-in/carry-out block. The cleaning/drying processing block includes cleaning/drying processing sections and a transport section. The transport section is provided with a transport mechanism. The carry-in/carry-out block is provided with a transport mechanism. The transport mechanism carries substrates in and out of an exposure device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.