Silicon/germanium particle inks, doped particles, printing and processes for semiconductor applications
US8632702B2 · kind B2 · utility
6Cited by
56References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Jan 2, 2008 |
| Grant date | Jan 21, 2014 |
| Priority date | — |
| Expiry date | May 4, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24909
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Highly uniform silicon/germanium nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silicon/germanium particles can be surface modified to form the dispersions. The silicon/germanium nanoparticles can be doped to change the particle properties. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to form selectively doped deposits of semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.