Patent · US Active

Method for the transparent coating of a substrate with plasma at atmospheric pressure

US8632859B2 · kind B2 · utility

0Cited by

2References

10Claims

0Family size

Assignee

Siemens Aktiengesellschaft · DE

Inventors

Florian Eder · Erlangen, DE
Rudolf Gensler · Singapore, SG

Key dates

Filing date	Aug 27, 2008
Grant date	Jan 21, 2014
Priority date	—
Expiry date	Dec 28, 2029

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03C2218/113
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

The invention relates to a method for improving the properties of coatings on transparent materials by plasma treatment, preferably by an atmospheric pressure plasma.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.