Patent · US Active

Composition for polishing surfaces of silicon dioxide

US8633111B2 · kind B2 · utility

0Cited by

6References

20Claims

0Family size

Assignee

BASF SE

Inventors

Sven Holger Behrens · Atlanta, US
Yaqian Liu · Ludwigshafen, DE
Gunter Kern · Bruchköbel, DE
Heidrun Debus · Eisenberg, DE

Key dates

Filing date	Dec 28, 2007
Grant date	Jan 21, 2014
Priority date	—
Expiry date	Aug 15, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/31053
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

A composition for polishing surfaces comprises the following components:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.