Chemical supply system
US8636477B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 22, 2011 |
| Grant date | Jan 28, 2014 |
| Priority date | — |
| Expiry date | Jan 27, 2032 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF04B43/073
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
This invention provides a chemical supply system for supplying chemical solution from a chemical tank. The chemical supply system includes a chemical supply pump, a pressure adjuster configured to suction the chemical solution into the pump chamber by setting the pressure of working gas to a suction pressure, a switching controller configured to switch the suction-side opening-closing valve to the open state for starting to fill the pump chamber with the chemical solution, a pressure detector configured to detect at least one of a gas pressure in a space connected to the working chamber and a gas pressure in the working chamber when the suction-side opening-closing valve is switched to the open state and starts an inflow of the chemical solution to the pump chamber, and a suction controller configured to control the suction pressure applied to the working chamber by the pressure adjuster, based on a detection result of the pressure detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.