Patent · US Active

Aromatic ring-containing compound for a resist underlayer and resist underlayer composition

US8637219B2 · kind B2 · utility

4Cited by
3References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 29, 2010
Grant dateJan 28, 2014
Priority date
Expiry dateAug 16, 2031

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07C2603/54
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

An aromatic ring-containing compound for a resist underlayer and a resist underlayer composition, the aromatic ring-containing compound being represented by the following Chemical Formula 1:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.