Aromatic ring-containing compound for a resist underlayer and resist underlayer composition
US8637219B2 · kind B2 · utility
4Cited by
3References
14Claims
0Family size
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Key dates
| Filing date | Dec 29, 2010 |
| Grant date | Jan 28, 2014 |
| Priority date | — |
| Expiry date | Aug 16, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/54
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
An aromatic ring-containing compound for a resist underlayer and a resist underlayer composition, the aromatic ring-containing compound being represented by the following Chemical Formula 1:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.