Device housing and method for making the same
US8637862B2 · kind B2 · utility
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7Claims
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Key dates
| Filing date | Apr 15, 2011 |
| Grant date | Jan 28, 2014 |
| Priority date | — |
| Expiry date | Feb 22, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C28/04
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A device housing is provided. The device housing includes a substrate, a silicon dioxide film formed on the substrate, and a zinc oxide film formed on the silicon dioxide film. The silicon dioxide film has micrometer sized structures. The zinc oxide film has nanometer sized structures. A method for making the device housing is also described there.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.