Carbon grit
US8641999B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2005 |
| Grant date | Feb 4, 2014 |
| Priority date | — |
| Expiry date | Apr 25, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/04
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Plasma assisted chemical vapor deposition is used to form single crystal diamond from a seed and methane. A susceptor is used to support the seed. Under certain conditions, crystalline grit is formed in addition to the diamond. The crystalline grit in one embodiment comprises mono crystals or twin crystals of carbon, each having its own nucleus. The crystals form in columns or tendrils to the side of the monocrystalline diamond or off a side of the susceptor. The crystals may have bonding imperfections which simulate doping, providing conductivity. They may also be directly doped. Many tools may be coated with the grit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.