Patent · US Active

Carbon grit

US8641999B2 · kind B2 · utility

0Cited by
14References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 11, 2005
Grant dateFeb 4, 2014
Priority date
Expiry dateApr 25, 2029

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC30B29/04
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Plasma assisted chemical vapor deposition is used to form single crystal diamond from a seed and methane. A susceptor is used to support the seed. Under certain conditions, crystalline grit is formed in addition to the diamond. The crystalline grit in one embodiment comprises mono crystals or twin crystals of carbon, each having its own nucleus. The crystals form in columns or tendrils to the side of the monocrystalline diamond or off a side of the susceptor. The crystals may have bonding imperfections which simulate doping, providing conductivity. They may also be directly doped. Many tools may be coated with the grit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.