Gas dispersion shield method
US8642124B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 4, 2010 |
| Grant date | Feb 4, 2014 |
| Priority date | — |
| Expiry date | Jul 5, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32449
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A gas dispersion shield and method for protecting the bottom surface of a gas deposition chamber, while injecting gas from a gas insertion channel into the chamber at a non-vertical angle. The gas dispersion shield includes a cylindrically shaped vertical sidewall, an annular flange extending horizontally and outwardly from the sidewall upper end, and a horizontal wall that extends inwardly from the sidewall lower end. The flange includes a top surface, a bottom surface, and a plurality of holes formed through the flange each extending in a non-vertical direction from the bottom surface to the top surface. The bottom surface includes an annular protrusion that fits at least partially into the gas insertion channel, to ensure the gas flows through the non-vertical holes instead of escaping around the flange.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.