Deposition mask and method of fabricating the same
US8646405B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 20, 2010 |
| Grant date | Feb 11, 2014 |
| Priority date | — |
| Expiry date | Aug 8, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/042
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition mask capable of forming layers with different thicknesses and a method of fabricating the same are disclosed. In one embodiment, the deposition mask includes i) a plurality of regions spaced apart from each other, wherein the plurality of regions comprise at least a first region and a second region and ii) first and second surfaces opposing each other, wherein the first surface is configured to receive a deposition material. Also, a through-hole is defined in each of the plurality of regions, and wherein at least one of the through-holes in the first surface of the mask is divided into a plurality of sub-regions. Further, the number of a sub-region or sub-regions of the first region is different from that of the second region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.