Patent · US Active

Plasma booster for plasma treatment installation

US8646409B2 · kind B2 · utility

0Cited by
5References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 10, 2012
Grant dateFeb 11, 2014
Priority date
Expiry dateOct 10, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/32018
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Vacuum treatment installation particularly for plasma coating workpieces has an arrangement for boosting and/or igniting a glow discharge plasma for the treatment of workpieces, and at least one hollow body of electrically conductive material, the hollow body including a hollow space and at least one entrance opening through which charge carriers flow in order to make possible ignition and operation of a plasma or to boost an existing plasma.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.