Patent · US Active

Two component etching

US8647526B2 · kind B2 · utility

0Cited by
5References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 12, 2010
Grant dateFeb 11, 2014
Priority date
Expiry dateJul 19, 2030

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

The object of the present invention is a new inkjet printable etching composition comprising an etchant, which is activated by a second component. Thus, a further object is the use of this new composition in a process for the etching of surfaces semiconductor devices or surfaces of solar cell devices.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.