Apparatus and method for coating photoresist
US8647703B2 · kind B2 · utility
0Cited by
2References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 28, 2005 |
| Grant date | Feb 11, 2014 |
| Priority date | — |
| Expiry date | Jun 28, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Provided is an apparatus for coating a photoresist on a substrate. The photoresist coating apparatus includes a nozzle, a discharge unit, and a foreign substance barrier. The nozzle coats a photoresist on the substrate. The discharge unit is formed in a body with a lower portion of the nozzle and discharges a photoresist. The foreign substance barrier is formed at a front lower portion of the nozzle and protects the discharge unit from a foreign substance on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.