Patent · US Active

Stabilization of silsesquioxane resins

US8648125B2 · kind B2 · utility

0Cited by
9References
4Claims
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Assignee

Inventors

Key dates

Filing dateDec 2, 2010
Grant dateFeb 11, 2014
Priority date
Expiry dateDec 2, 2030

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08G77/80
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

Disclosed is silsesquioxane resin composition that contains a free radical curable functional group that is stabilized with a hydrophilic inhibitor. The hydrophilic inhibitor that has the capability to scavenge free radicals such as ascorbic acid or salicylic acid is used to stabilize the resin. The resins are useful in semiconductor formation such as for anti-reflective coatings, hardmasks or photoresist layers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.