Patent · US Active

Process for preparing solutions of radiation-sensitive, free-radically polymerizable organic compounds

US8648212B2 · kind B2 · utility

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Key dates

Filing dateMar 30, 2010
Grant dateFeb 11, 2014
Priority date
Expiry dateJul 3, 2030

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09J2301/304
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A description is given of a process for preparing solutions of radiation-sensitive, free-radically polymerizable organic compounds, where a first starting compound, which has an acid halide group, and a second starting compound, which has an alcoholic hydroxyl group, are esterified with one another in a solvent or in a solvent mixture. The solvent comprises one or more ketones having a boiling point of below 150° C. under atmospheric pressure (1 bar), or the solvent mixture is composed to an extent of at least 50% by weight of said ketones. One of the two starting compounds has at least one radiation-sensitive group and the other of the two starting compounds has at least one ethylenically unsaturated, free-radically polymerizable group. A description is also given of corresponding solutions of radiation-sensitive, free-radically polymerizable organic compounds and of their use for preparing radiation-crosslinkable, free-radically copolymerized copolymers, more particularly for hotmelt pressure-sensitive adhesives or aqueous polymer dispersions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.