Gas concentration monitor
US8648731B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 9, 2010 |
| Grant date | Feb 11, 2014 |
| Priority date | — |
| Expiry date | Dec 23, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/3513
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Techniques are generally described related to a method and system for monitoring gas concentrations. One example gas monitoring apparatus includes a light source, a MEMS micro-mirror arranged to be in an optical path of a light from the light source that has passed through a sample and configured to direct selected wavelengths of the light to a single detection point, a detector arranged at the single detection point and configured to convert incident light into electrical signals, and a processor programmed to determine a gas concentration of one or more gases in the sample based on the electrical signals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.