Side gas injector for plasma reaction chamber
US8652296B2 · kind B2 · utility
2Cited by
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9Claims
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Assignee
Inventors
Key dates
| Filing date | Aug 30, 2010 |
| Grant date | Feb 18, 2014 |
| Priority date | — |
| Expiry date | Sep 20, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A side gas injector for a plasma reaction chamber is provided. The side gas injector includes a circular distribution plate and a cover plate. The circular distribution plate includes an injection hole for injecting a reaction gas and a distribution channel part for distributing the reaction gas such that the reaction gas introduced from the injection hole can be radially simultaneously jetted in a plurality of positions along an inner circumference surface of the distribution plate. The cover plate is coupled to a top of the distribution plate and seals a top of the distribution channel part.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.