Process for producing nanostructured and/or microstructured surfaces in an adhesive layer, more particularly in a self-adhesive layer

US8652376B2 · kind B2 · utility

Assignee

• tesa SE · DE

Inventor

• Axel Burmeister · Hamburg, DE

Key dates

• Filing date: Feb 20, 2008
• Grant date: Feb 18, 2014
• Expiry date: Jan 30, 2029

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/24802
• WIPO field: Other special machines
• WIPO sector: Mechanical engineering

Abstract

The invention relates to a process for producing nanostructured and/or microstructured surfaces in an adhesive layer, more particularly in a self-adhesive layer, in which an adhesive polymer mixture, more particularly a self-adhesive polymer mixture, is guided into a nip formed by a relief roll, whose surface has been provided with a relief which represents the negative of the surface structure to be produced on the adhesive layer, and by a nip roll, and where the relief roll and the nip roll rotate in opposite directions, wrapped partly around the relief roll is a web-form carrier material which is guided through the nip and whose speed corresponds more particularly to the peripheral speed of the relief roll, the adhesive polymer mixture, more particularly the self-adhesive polymer mixture, is pressed through the nip, so that the near-roll surface of the polymer mixture is shaped in accordance with the relief, lies in layer form on the carrier material after passage through the nip, and is guided away with the carrier material.