C-plane sapphire method and apparatus
US8652658B2 · kind B2 · utility
13Cited by
20References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 21, 2007 |
| Grant date | Feb 18, 2014 |
| Priority date | — |
| Expiry date | Jul 21, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/23986
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus for the production of C-plane single crystal sapphire is disclosed. The method and apparatus may use edge defined film-fed growth techniques for the production of single crystal material exhibiting low polycrystallinity and/or low dislocation density.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.