Patent · US Active

C-plane sapphire method and apparatus

US8652658B2 · kind B2 · utility

13Cited by
20References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 21, 2007
Grant dateFeb 18, 2014
Priority date
Expiry dateJul 21, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/23986
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method and apparatus for the production of C-plane single crystal sapphire is disclosed. The method and apparatus may use edge defined film-fed growth techniques for the production of single crystal material exhibiting low polycrystallinity and/or low dislocation density.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.