Method and apparatus for the formation of an electronic device
US8652964B2 · kind B2 · utility
2Cited by
1References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 28, 2009 |
| Grant date | Feb 18, 2014 |
| Priority date | — |
| Expiry date | Oct 8, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K10/84
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process of forming an electronic device, by forming the source and drain contacts using photolithography, incorporating a self-assembled monolayer (SAM) over the electrical contacts to form an increased work function of the source and drain electrodes and further forming more favorable charge injection properties or within the channel region to improve film morphology and therefore improve charge transport. The SAM material is added to the photoresist stripper during a step of the photolithography process of forming electrical contacts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.