Patent · US Active

Method of forming substrate for fluid ejection device

US8653410B2 · kind B2 · utility

1Cited by
86References
35Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 28, 2005
Grant dateFeb 18, 2014
Priority date
Expiry dateAug 15, 2033

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB41J2/1634
  • WIPO fieldTextile and paper machines
  • WIPO sectorMechanical engineering

Abstract

A method of forming an opening through a substrate having a first side and a second side opposite the first side includes laser machining a first portion of the opening into the substrate from the second side toward the first side, and abrasive machining a second portion of the opening into the substrate. Abrasive machining the second portion of the opening into the substrate includes completing the opening through the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.