Plasma treatment of substrates prior to the formation a self-assembled monolayer
US8658258B2 · kind B2 · utility
14Cited by
7References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 21, 2009 |
| Grant date | Feb 25, 2014 |
| Priority date | — |
| Expiry date | Dec 23, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D3/142
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An improved method for forming a self-assembled monolayer on a substrate is disclosed. The method comprises plasma treatment of the substrate prior to formation of the self-assembled monolayer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.