Patent · US Active

Wet-chemical method for producing high-temperature superconductor

US8658571B2 · kind B2 · utility

1Cited by

4References

21Claims

0Family size

Assignee

BASF SE

Inventors

Isabel Van Driessche · Waasmunster, BE
Pieter Vermeir · Lokeren, BE
Serge Hoste · Merelbeke, BE
Michael Baecker · Cologne, DE

Key dates

Filing date	Mar 18, 2010
Grant date	Feb 25, 2014
Priority date	—
Expiry date	Dec 16, 2031

Classification

Technology area (CPC H)Electricity
CPC primaryH10N60/0548
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The invention relates to a method for the wet chemical production of an HTSL on a carrier, wherein an HTSL precursor solution comprising no trifluoroacetate may be utilized if the same is heated to a temperature Ts during the heat treatment of the HTSL precursor, wherein the remaining substances of the HTSL precursor solution form at least a partial melt, which is below the temperature at which RE2BaCuOx is formed, and which is deposited from the liquid phase while forming a peritectic.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.