Systems and methods for creating and editing seam carving masks
US8659622B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 31, 2009 |
| Grant date | Feb 25, 2014 |
| Priority date | — |
| Expiry date | May 8, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T3/04
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Systems and methods for creating and editing seam carving masks may allow a user to combine masks, and/or to modify automatically generated suggested masks, manually created masks, combination masks, or previously stored masks using tools of a graphical user interface in a graphics application (e.g., a mask brush or mask eraser). The method may include accessing data representing an image and automatically generating a suggested mask for the image (e.g., based on a color or color range, a threshold energy value, or input specifying two or more previously stored masks for combination). The method may include displaying the suggested mask as an overlay of the image, highlighting mask pixels using a respective color or pattern. The user may indicate pixels to be added to or removed from the suggested mask to produce a modified mask for application in an image editing operation (e.g., a resizing, filtering, or feature identification operation).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.