Apparatus for carrying out plasma chemical vapour deposition and method of manufacturing an optical preform
US8662011B2 · kind B2 · utility
4Cited by
11References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 1, 2008 |
| Grant date | Mar 4, 2014 |
| Priority date | — |
| Expiry date | May 19, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03B2201/31
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The present invention relates to an apparatus for carrying out plasma chemical vapor deposition, by which one or more layers of doped or undoped silica are deposited onto the interior of an elongated hollow glass substrate tube. The present invention further relates to a method of manufacturing an optical preform by means of plasma chemical vapor deposition, wherein doped or undoped glass-forming gases are passed through the interior of an elongated glass substrate tube while conditions for depositing glass layers are created in the interior of the substrate tube.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.