Laser beam pattern projector
US8662707B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 1, 2008 |
| Grant date | Mar 4, 2014 |
| Priority date | — |
| Expiry date | Jan 25, 2031 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF41H11/02
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Methods and systems consistent with some embodiments presented provide methods for denying visual access to a first area from a target area. In some embodiments, methods for denying visual access from a target area may include generating a structured light pattern and projecting the structured light pattern from onto the target area. The structured light pattern may be moved at a rate and in a pattern to deny visual access of a first area from the target area. In some embodiments, the rate and the pattern may be chosen based on characteristics of the target area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.