Eccentricity measuring method
US8665425B2 · kind B2 · utility
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2References
12Claims
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Key dates
| Filing date | Apr 5, 2011 |
| Grant date | Mar 4, 2014 |
| Priority date | — |
| Expiry date | Apr 5, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01M11/025
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In an eccentricity measuring method according to the present invention, a first position of a light source image formed by reflection at one optical surface is measured (S2), a predetermined second position related to another optical surface is measured (S3), and a relative eccentricity between both optical surfaces is calculated based on the first and second positions (S5). Therefore, the eccentricity measuring method enables measurement of eccentricity by a same measurement optical system regardless of a radius of curvature of an optical surface of an optical element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.