Contour-based defect detection using an inspection apparatus
US8669523B2 · kind B2 · utility
3Cited by
11References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 2, 2012 |
| Grant date | Mar 11, 2014 |
| Priority date | — |
| Expiry date | Mar 2, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
One embodiment relates to a method of inspecting a site location on a target substrate. Contours are obtained, the contours having been generated from a reference image using a design clip. A target image of the site location is acquired. The contours are aligned to the target image, and contrast values are computed for pixels on the contours. A threshold is applied to the contrast values to determine contour-based defect blobs. Another embodiment relates to a method of generating contours for use in inspecting a site location for defects. Other embodiments, aspects and features are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.