Vapor deposition device, vapor deposition method, and organic EL display device
US8673077B2 · kind B2 · utility
24Cited by
2References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 2, 2012 |
| Grant date | Mar 18, 2014 |
| Priority date | — |
| Expiry date | Mar 2, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/233
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Vapor deposition particles (91) discharged from at least one vapor deposition source opening (61) pass through a plurality of limiting openings (82) of a limiting unit (80) and a plurality of mask openings (71) of a vapor deposition mask (70), and adhere to a substrate (10) that relatively moves along a second direction (10a) so as to form a coating film. The limiting unit includes a plurality of plate members stacked on one another. Accordingly, it is possible to efficiently form a vapor deposition coating film in which edge blurring is suppressed on a large-sized substrate at a low cost.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.