Method for forming fine pattern of polymer thin film
US8673403B2 · kind B2 · utility
0Cited by
0References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 17, 2009 |
| Grant date | Mar 18, 2014 |
| Priority date | — |
| Expiry date | Mar 18, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/135
Abstract
Provided is a method of forming a fine pattern of a polymer thin film using a phenomenon that another material having a large difference in surface energy in comparison with a polymer thin film pattern is dewetted on the polymer thin film pattern. Two polymer materials having a large difference in surface energy can be applied to readily and conveniently form a fine pattern of a polymer thin film of micrometer or sub-micrometer grade.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.