Patent · US Active

Block copolymer assembly methods and patterns formed thereby

US8673541B2 · kind B2 · utility

14Cited by
9References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 29, 2010
Grant dateMar 18, 2014
Priority date
Expiry dateOct 29, 2030

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24926
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Patterned substrates templates are provided, as well as methods comprising a combination of lithography and self-assembly techniques. The patterned substrates may comprise first and second patterns.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.