Low irritancy cleansing compositions
US8673833B2 · kind B2 · utility
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11Claims
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Key dates
| Filing date | Aug 2, 2010 |
| Grant date | Mar 18, 2014 |
| Priority date | — |
| Expiry date | Aug 2, 2030 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61Q19/10
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
A low irritancy cleansing composition comprises: (a) an anionic surfactant compound of formula (I): wherein R1 represents a C4-36 substituted or unsubstituted hydrocarbyl group; each of R2, R3, R4 and R5 independently represents a hydrogen atom or a C1-4 alkyl group and wherein at least one of R2, R3, R4 and R5 is not hydrogen and M+ represents a cation; and (b) an amphoteric surfactant; wherein the molar ratio of component (a) to component (b) is from 0.25:1 to 4:1 and wherein the composition comprises less than 3 wt % polyethoxylated non-ionic species.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.