Apparatus for metering granular source material in a thin film vapor deposition apparatus
US8677932B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 3, 2011 |
| Grant date | Mar 25, 2014 |
| Priority date | — |
| Expiry date | Feb 5, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F11/24
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A metering mechanism is configured for transferring measured doses of a granular material from a first location to a second location, and is particularly suited for metering source material in a vapor deposition apparatus. A receiver is disposed to receive the granular material from the first location. A discharge port is axially offset from an outlet of the receiver. A reciprocating delivery member having a passage defined therethrough is moved in a reciprocating path by a controllable drive device between a load position wherein the passage is aligned with the receiver outlet and a discharge position wherein the passage is aligned with the discharge port. The amount of granular material transferred from the first location to the second location is a function of the volume of the passage and the reciprocating rate of the delivery member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.