System and a method for nano imprinting
US8678284B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 16, 2009 |
| Grant date | Mar 25, 2014 |
| Priority date | — |
| Expiry date | Sep 16, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for creating a highly accurate nanostructure is provided, the method includes: (i) creating a highly accurate nanostructure prototype, wherein the highly accurate nanostructure prototype, when illuminated with a predefined illumination, provides a unique optical pattern; (ii) creating at least one highly accurate nanostructure mold from the highly accurate nanostructure prototype, wherein each highly accurate nanostructure mold enables a creation of a highly accurate nanostructure that is substantially similar to the highly accurate nanostructure prototype and which, when illuminated with the predefined illumination, provides the unique optical pattern; and (iii) molding the highly accurate nanostructure using the highly accurate nanostructure mold, wherein the highly accurate nanostructure, when illuminated with the predefined illumination, provides the unique optical pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.