Fluid treatment system
US8679416B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 17, 2007 |
| Grant date | Mar 25, 2014 |
| Priority date | — |
| Expiry date | Nov 19, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC02F2209/42
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
There is described a fluid treatment system. The fluid treatment system comprises: an open channel for receiving a flow of fluid and a fluid treatment zone. The fluid treatment zone comprising a plurality of elongate radiation source assemblies orientated such that: (i) a longitudinal axis of each radiation source assembly is transverse to a direction of fluid flow through the fluid treatment zone, and (ii) an end of each radiation source assembly is disposed above a predetermined maximum height of fluid flow in the open channel. A first baffle plate is disposed upstream of the fluid treatment zone. The first baffle plate is positioned such that a distal end thereof is below the predetermined maximum height of fluid flow in the open channel. In a preferred embodiment, the present fluid treatment system provides for an area in which a cleaning system for the radiation source assemblies can be “parked” when not in use. In the so-called “parked” position, the cleaning system may be readily accessed for servicing and the like without affecting the flow of fluid through the fluid treatment zone and a fluid treatment system. This is as significant advantage of the fluid treatment system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.